The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Mar. 30, 2010
Takayuki Kato, Shizuoka, JP;
Hiroshi Saegusa, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Yusuke Iizuka, Shizuoka, JP;
Shuhei Yamaguchi, Shizuoka, JP;
Akinori Shibuya, Shizuoka, JP;
Takayuki Kato, Shizuoka, JP;
Hiroshi Saegusa, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Yusuke Iizuka, Shizuoka, JP;
Shuhei Yamaguchi, Shizuoka, JP;
Akinori Shibuya, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition, wherein when a film having a film thickness of 100 nm is formed from the actinic ray-sensitive or radiation-sensitive resin composition, the film has a transmittance of 55 to 80% for light at a wavelength of 193 nm, and a pattern forming method using the composition are provided.