The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Sep. 21, 2011
Taiga Uno, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Hiromitsu Mashita, Kanagawa, JP;
Yukiyasu Arisawa, Ibaraki, JP;
Taiga Uno, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Hiromitsu Mashita, Kanagawa, JP;
Yukiyasu Arisawa, Ibaraki, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
In the method of correcting a mask pattern according to the embodiments, a mask pattern correction amount for a reference flare value is calculated as a reference mask correction amount, for every type of patterns within the layout, and a change amount of the mask pattern correction amount corresponding to the change amount of the flare value is calculated as the change amount information. A mask pattern corresponding to the flare value of the pattern is created based on the reference mask correction amount and the change amount information corresponding to the pattern, extracted from the information having the pattern, the reference mask correction amount, and the change amount information correlated with each other, and based on a difference between the flare value of the pattern and the reference flare value.