The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Jan. 28, 2005
Daniel J. Hoffman, Saratoga, CA (US);
Roger A. Lindley, Santa Clara, CA (US);
Michael C. Kutney, Santa Clara, CA (US);
Martin J. Salinas, San Jose, CA (US);
Hamid F. Tavassoli, Cupertino, CA (US);
Keiji Horioka, Chiba, JP;
Douglas A. Buchberger, Jr., Livermore, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Roger A. Lindley, Santa Clara, CA (US);
Michael C. Kutney, Santa Clara, CA (US);
Martin J. Salinas, San Jose, CA (US);
Hamid F. Tavassoli, Cupertino, CA (US);
Keiji Horioka, Chiba, JP;
Douglas A. Buchberger, Jr., Livermore, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma reactor for processing a workpiece, includes a vacuum chamber defined by a sidewall and ceiling, and a workpiece support pedestal having a workpiece support surface in the chamber and facing the ceiling and including a cathode electrode. An RF power generator is coupled to the cathode electrode. Plasma distribution is controlled by an external annular inner electromagnet in a first plane overlying the workpiece support surface, an external annular outer electromagnet in a second plane overlying the workpiece support surface and having a greater diameter than the inner electromagnet, and an external annular bottom electromagnet in a third plane underlying the workpiece support surface. D.C. current supplies are connected to respective ones of the inner, outer and bottom electromagnets.