The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Feb. 14, 2008
I-hsiung Huang, Hsinchu County, TW;
Chi-lin LU, Hsinchu, TW;
Heng-jen Lee, Hsinchu County, TW;
Sheng-chi Chin, Jhubei, TW;
Yao-ching Ku, Hsinchu, TW;
I-Hsiung Huang, Hsinchu County, TW;
Chi-Lin Lu, Hsinchu, TW;
Heng-Jen Lee, Hsinchu County, TW;
Sheng-Chi Chin, Jhubei, TW;
Yao-Ching Ku, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method and system for fabricating a substrate is disclosed. First, a plurality of process chambers are provided, at least one of the plurality of process chambers adapted to receive at least one plasma filtering plate and at least one of the plurality of process chambers containing a plasma filtering plate library. A plasma filtering plate is selected and removed from the plasma filtering plate library. Then, the plasma filtering plate is inserted into at least one of the plurality of process chambers adapted to receive at least one plasma filtering plate. Subsequently, an etching process is performed in the substrate.