The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Oct. 27, 2010
Yohei Yamazawa, Nirasaki, JP;
Chishio Koshimizu, Nirasaki, JP;
Masashi Saito, Nirasaki, JP;
Kazuki Denpoh, Nirasaki, JP;
Jun Yamawaku, Nirasaki, JP;
Hachishiro Iizuka, Nirasaki, JP;
Yohei Yamazawa, Nirasaki, JP;
Chishio Koshimizu, Nirasaki, JP;
Masashi Saito, Nirasaki, JP;
Kazuki Denpoh, Nirasaki, JP;
Jun Yamawaku, Nirasaki, JP;
Hachishiro Iizuka, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus includes: a processing chamber including a dielectric window; a coil-shaped RF antenna, provided outside the dielectric window; a substrate supporting unit, provided in the chamber, for mounting thereon a target substrate; a processing gas supply unit for supplying a processing gas to the chamber; and an RF power supply unit for supplying an RF power to the RF antenna to generate a plasma of the processing gas by an inductive coupling in the chamber. The apparatus further includes a correction coil, provided at a position outside the chamber where the correction coil is to be coupled with the RF antenna by an electromagnetic induction, for controlling a plasma density distribution in the chamber; and an antenna-coil distance control unit for controlling a distance between the RF antenna and the correction coil while supporting the correction coil substantially in parallel with the RF antenna.