The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Oct. 07, 2004
Tsuyoshi Moriya, Nirasaki, JP;
Hiroshi Nagaike, Nirasaki, JP;
Teruyuki Hayashi, Nirasaki, JP;
Kaoru Fujihara, Nirasaki, JP;
Tsuyoshi Moriya, Nirasaki, JP;
Hiroshi Nagaike, Nirasaki, JP;
Teruyuki Hayashi, Nirasaki, JP;
Kaoru Fujihara, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In order to prevent particles within a unit from sticking to a substrate in a substrate processing process, an ion generator charges the particles. At the same time, a direct current voltage of the same polarity as the charged polarity of the particles is applied from a direct current power source to the substrate. In order to prevent generation of particles when producing gas plasma, a high-frequency voltage is applied to the upper and lower electrodes at multiple stages to produce plasma. In other words, at a first step, a minimum high-frequency voltage at which plasma can be ignited is applied to the upper and lower electrodes, thereby producing a minimum plasma. Thereafter, the applied voltage is increased in stages to produce predetermined plasma.