The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Mar. 28, 2011
Applicants:
Wei Fang, Milpitas, CA (US);
Jack Jau, Los Altos Hills, CA (US);
Zhao-li Zhang, San Jose, CA (US);
Inventors:
Assignee:
Hermes Microvision, Inc., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/46 (2006.01); G06K 9/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A plurality of points with identical geometric feature is compared with their SEM characteristic features to inspect defect in a localized image. Original design information is included in the geometric feature such that absolute compare can be performed in this inspection method. Further, this method can also be applied to the localized image with or without repeated or redundant pattern.
Fang, Wei. (2013). Method for inspecting localized image and system thereof (U.S. Patent No. 8606017). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8606017
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile