The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Nov. 01, 2011
Chih-jen Wu, Chu-Dong Town, TW;
Chen-ming Huang, Hsinchu, TW;
Kuan-chieh Huang, Hsinchu, TW;
Chi-yuan Shih, Hsinchu, TW;
Chin-hsiang Lin, Hsin-Chu, TW;
Chih-Jen Wu, Chu-Dong Town, TW;
Chen-Ming Huang, Hsinchu, TW;
Kuan-Chieh Huang, Hsinchu, TW;
Chi-Yuan Shih, Hsinchu, TW;
Chin-Hsiang Lin, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
One of the broader forms of the present disclosure involves a method of enhanced defect inspection. The method includes providing a substrate having defect particles and providing a fluid over the substrate and the defect particles, the fluid having a refractive index greater than air. The method further includes exposing the substrate and the defect particles to incident radiation through the fluid, and detecting, through the fluid, radiation reflected or scattered by the defect particles.