The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Jun. 03, 2005
Alexandra Pazidis, Aalen, DE;
Reiner Garreis, Aalen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Heiko Feldmann, Schwaebisch Gmuend, DE;
Paul Graeupner, Aalen, DE;
Hans-juergen Rostalski, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Guenter Scheible, Stuttgart, DE;
Sigrid Scheible, Stuttgart, DE;
Patrick Scheible, Aalen, DE;
Alexandra Pazidis, Aalen, DE;
Reiner Garreis, Aalen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Heiko Feldmann, Schwaebisch Gmuend, DE;
Paul Graeupner, Aalen, DE;
Hans-Juergen Rostalski, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.