The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Nov. 05, 2012
Synopsys, Inc., Mountain View, CA (US);
Charles C. Chiang, Saratoga, CA (US);
Yen-Ting Yu, New Taipei, TW;
Hui-Ru Jiang, New Taipei, TW;
Subarnarekha Sinha, Palo Alto, CA (US);
Ya-Chung Chan, Miaoli County, TW;
Synopsys, Inc., Mountain View, CA (US);
Abstract
An accurate process hotspot detection technique based on DRC is provided. In this technique, critical DRC rules can be extracted from a pattern. This extraction can include generating horizontal tiles and vertical tiles in the pattern, and adding directed edges to indicate relations between adjacent tiles in the pattern. Rule rectangles, which can also be generated during the critical DRC rule extraction, describe polygon placement in the pattern with a minimal number of critical DRC rules. The extracted DRC rules can be included in a DRC runset file. DRC can be performed with the DRC runset file on a layout. The DRC results can be filtered using the rule rectangles to identify potential hotspots and to verify actual hotspots.