The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Nov. 10, 2011
Applicants:
Teunis Van DE Peut, Leusden, NL;
Marco Jan-jaco Wieland, Delft, NL;
Inventors:
Teunis Van De Peut, Leusden, NL;
Marco Jan-Jaco Wieland, Delft, NL;
Assignee:
Mapper Lithography IP B.V., Delft, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/06 (2006.01); H01J 37/07 (2006.01); G21K 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to a method of generating a two-level pattern for lithographic processing by multiple beamlets. In the method, first a pattern in vector format is provided. The vector format pattern is then converted into a pattern in pixmap format. Finally, a two-level pattern is formed by application of error diffusion on the pixmap format pattern.