The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Nov. 14, 2011
Louis Steen, Atkinson, NH (US);
Yuri Erokhin, Georgetown, MA (US);
Hans-joachin Ludwig Gossmann, Summit, NJ (US);
Louis Steen, Atkinson, NH (US);
Yuri Erokhin, Georgetown, MA (US);
Hans-Joachin Ludwig Gossmann, Summit, NJ (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
An improved method of doping a workpiece is disclosed. In this method, a film comprising the species to be implanted is introduced to the surface of a planar or three-dimensional workpiece. This film can be grown using CVD, a bath or other means. The workpiece with the film is then subjected to ion bombardment to help drive the dopant into the workpiece. This ion bombardment is performed at elevated temperatures to reduce crystal damage and create a more abrupt doped region.