The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Jun. 08, 2011
Feng-yi Chang, Tainan, TW;
Yi-po Lin, Tainan, TW;
Jiunn-hsiung Liao, Tainan, TW;
Shang-yuan Tsai, Kaohsiung, TW;
Chih-wen Feng, Tainan, TW;
Shui-yen LU, Hsinchu County, TW;
Ching-pin Hsu, Tainan, TW;
Feng-Yi Chang, Tainan, TW;
Yi-Po Lin, Tainan, TW;
Jiunn-Hsiung Liao, Tainan, TW;
Shang-Yuan Tsai, Kaohsiung, TW;
Chih-Wen Feng, Tainan, TW;
Shui-Yen Lu, Hsinchu County, TW;
Ching-Pin Hsu, Tainan, TW;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A method for fabricating an aperture is disclosed. The method includes the steps of: forming a hard mask containing carbon on a surface of a semiconductor substrate; and using a non-oxygen element containing gas to perform a first etching process for forming a first aperture in the hard mask.