The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2013
Filed:
Dec. 16, 2010
Johannes Groschopf, Radebeul, DE;
Rico Hueselitz, Goeda, DE;
Marco Kitsche, Dresden, DE;
Katja Steffen, Dresden, DE;
Johannes Groschopf, Radebeul, DE;
Rico Hueselitz, Goeda, DE;
Marco Kitsche, Dresden, DE;
Katja Steffen, Dresden, DE;
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
For complex CMP processes requiring the removal of different dielectric materials, possibly in the presence of a polysilicon material, a slurry material may be adapted at the point of use by selecting an appropriate pH value and avoiding agglomeration of the abrasive particles. The in situ preparation of the slurry material may also enable a highly dynamic adaptation of the removal conditions, for instance when exposing the polysilicon material of gate electrode structures in replacement gate approaches.