The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8581318 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 12, 2013

Filed:

Jan. 09, 2013
Applicant:

Intermolecular, Inc., San Jose, CA (US);

Inventors:

Hanhong Chen, Milpitas, CA (US);

Wim Deweerd, San Jose, CA (US);

Edward L. Haywood, San Jose, CA (US);

Sandra G. Malhotra, Fort Collins, CO (US);

Hiroyuki Ode, Higashihiroshima, JP;

Assignee:

Intermolecular, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01); H01L 29/94 (2006.01);
U.S. Cl.
CPC ...
Abstract

A metal oxide first electrode material for a MIM DRAM capacitor is formed wherein the first and/or second electrode materials or structures contain layers having one or more dopants up to a total doping concentration that will not prevent the electrode materials from crystallizing during a subsequent anneal step. Advantageously, the electrode doped with one or more of the dopants has a work function greater than about 5.0 eV. Advantageously, the electrode doped with one or more of the dopants has a resistivity less than about 1000 μΩcm. Advantageously, the electrode materials are conductive molybdenum oxide.


Find Patent Forward Citations

Chen, Hanhong. (2013). Enhanced non-noble electrode layers for dram capacitor cell (U.S. Patent No. 8581318). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8581318

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