The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Jun. 20, 2011
Rongjun Wang, Dublin, CA (US);
Sally Lou, Santa Clara, CA (US);
Muhammad Rasheed, San Jose, CA (US);
Jianxin Lei, Sunnyvale, CA (US);
Xianmin Tang, San Jose, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Ryan Hanson, Palo Alto, CA (US);
Tza-jing Gung, San Jose, CA (US);
Keith A. Miller, Mountain View, CA (US);
Thanh X. Nguyen, San Jose, CA (US);
Rongjun Wang, Dublin, CA (US);
Sally Lou, Santa Clara, CA (US);
Muhammad Rasheed, San Jose, CA (US);
Jianxin Lei, Sunnyvale, CA (US);
Xianmin Tang, San Jose, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Ryan Hanson, Palo Alto, CA (US);
Tza-Jing Gung, San Jose, CA (US);
Keith A. Miller, Mountain View, CA (US);
Thanh X. Nguyen, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus to improve target life and deposition uniformity in PVD chambers are provided herein. In some embodiments, a magnetron assembly includes a shunt plate having a central axis, the shunt plate rotatable about the central axis, a first open loop magnetic pole arc coupled to the shunt plate at a first radius from the central axis, and a second open loop magnetic pole arc coupled the shunt plate at a first distance from the first open loop magnetic pole arc, wherein at least one of the first radius varies along the first open loop magnetic pole arc or the first distance varies along the second open loop magnetic pole arc. In some embodiments, a first polarity of the first open loop magnetic pole arc opposes a second polarity of the second open loop magnetic pole arc.