The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Dec. 10, 2007
Voha Nuch, Shanghai, CN;
David Wang, Shanghai, CN;
Yue MA, Shanghai, CN;
Fufa Chen, Shanghai, CN;
Jian Wang, Shanghai, CN;
Yunwen Huang, Shanghai, CN;
Liangzhi Xie, Shanghai, CN;
Chuan He, Shanghai, CN;
Voha Nuch, Shanghai, CN;
David Wang, Shanghai, CN;
Yue Ma, Shanghai, CN;
Fufa Chen, Shanghai, CN;
Jian Wang, Shanghai, CN;
Yunwen Huang, Shanghai, CN;
Liangzhi Xie, Shanghai, CN;
Chuan He, Shanghai, CN;
ACM Research (Shanghai) Inc., , CN;
Abstract
An apparatus for cleaning and conditioning the surface of a semiconductor substrate such as wafer includes a rotatable chuck, a chamber, a rotatable tray for collecting cleaning solution with one or more drain outlets, multiple receptors for collecting multiple cleaning solutions, a first motor to drive chuck, and a second motor to drive the tray. The drain outlet in the tray can be positioned directly above its designated receptor located under the drain outlet. The cleaning solution collected by the tray can be guided into designated receptor. One characteristic of the apparatus is having a robust and precisely controlled cleaning solution recycle with minimum cross contamination.