The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Mar. 14, 2013
Intermolecular, Inc., San Jose, CA (US);
Thomas R. Boussie, Santa Clara, CA (US);
Tony P. Chiang, Campbell, CA (US);
Anh Duong, Fremont, CA (US);
Zachary Fresco, Santa Rosa, CA (US);
Nitin Kumar, Fremont, CA (US);
Chi-I Lang, Cupertino, CA (US);
Sandra G. Malhotra, Fort Collins, CO (US);
Jinhong Tong, Santa Clara, CA (US);
Intermolecular, Inc., San Jose, CA (US);
Abstract
Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.