The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2013
Filed:
Nov. 21, 2007
Applicants:
Wenzhan Zhou, Singapore, SG;
Liang Choo Hsia, Singapore, SG;
Meisheng Zhou, Singapore, SG;
Zheng Zou, Singapore, SG;
Inventors:
Wenzhan Zhou, Singapore, SG;
Liang Choo Hsia, Singapore, SG;
Meisheng Zhou, Singapore, SG;
Zheng Zou, Singapore, SG;
Assignee:
GLOBALFOUNDRIES Singapore Pte. Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
An optical proximity correction (OPC) model incorporates inline process variation data. OPC is performed by adjusting an input mask pattern with a mask bias derived from the OPC model to correct errors in the input mask pattern.