The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Feb. 06, 2012
Yi-ting Chen, Kaohsiung, TW;
Chien-hao Chen, Tainan, TW;
Yuan-chi Pai, Tainan, TW;
Chun-chi Yu, Taipei, TW;
Yi-Ting Chen, Kaohsiung, TW;
Chien-Hao Chen, Tainan, TW;
Yuan-Chi Pai, Tainan, TW;
Chun-Chi Yu, Taipei, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
An overlay mark is described, including N (N≧2) groups of first x-directional linear patterns each defined from a different one of N pre-layers, N groups of second x-directional linear patterns of a current layer, N groups of first y-directional linear patterns each defined from a different one of the N pre-layers, and N groups of second y-directional linear patterns of the current layer. Each group of second x-directional linear patterns is disposed together with one group of first x-directional linear patterns, wherein the second linear patterns and the x-directional linear patterns are arranged alternately. Each group of second y-directional linear patterns is disposed together with one group of first y-directional linear patterns, wherein the second linear patterns and the first linear patterns are arranged alternately.