The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2013

Filed:

May. 11, 2012
Applicants:

Jun Yashima, Kanagawa, JP;

Akihito Anpo, Tokyo, JP;

Inventors:

Jun Yashima, Kanagawa, JP;

Akihito Anpo, Tokyo, JP;

Assignee:

NuFlare Technology, Inc., Numazu-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); G03B 27/32 (2006.01); G03B 27/42 (2006.01); H01J 37/20 (2006.01); H01J 37/02 (2006.01); H01J 37/153 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/02 (2013.01); H01J 37/153 (2013.01); Y10S 430/143 (2013.01);
Abstract

A charged particle beam writing apparatus, includes a unit to input information about a stripe region height, and to judge, when a write region is divided into stripe regions in a thin rectangular shape by the stripe region height, whether a height of a last stripe region is narrower than the stripe region height; and a unit to divide the write region into stripe regions in the thin rectangular shape in such a way that the last stripe region and a stripe region prior to the last stripe region are combined to create one stripe region and stripe regions at least two stripe regions prior to the last stripe region are each created as stripe regions of the stripe region height if the height of the last stripe region is narrower than the stripe region height.


Find Patent Forward Citations

Loading…