The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Nov. 15, 2010
Yuichi Madokoro, Hitachinaka, JP;
Hirokazu Kaneoya, Hitachinaka, JP;
Tsuyoshi Onishi, Hitachinaka, JP;
Isamu Sekihara, Hitachinaka, JP;
Yuichi Madokoro, Hitachinaka, JP;
Hirokazu Kaneoya, Hitachinaka, JP;
Tsuyoshi Onishi, Hitachinaka, JP;
Isamu Sekihara, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Disclosed is an operation for an optical system which achieves observation of focused ion beam processing equivalent to that in a case wherein a sample stage is tilted mechanically. In a focused ion beam optical system, an aperture, a tilting deflector, a beam scanner, and an objective lens are controlled so as to irradiate an ion beam tilted to the optical axis of the optical system, thereby achieving thin film processing and a cross section processing without accompanying adjustment and operation for a sample stage. The thin film processing and the cross section processing with a focused ion beam can be automated, and yield can be improved. For example, by applying the present invention to a cross section monitor to detect an end point, the cross section processing can be easily automated.