The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Nov. 30, 2009
Patrick Vuillod, St. Bernard du Touvet, FR;
Jean-christophe Madre, Grenoble, FR;
Patrick Vuillod, St. Bernard du Touvet, FR;
Jean-Christophe Madre, Grenoble, FR;
Synopsys, Inc., Mountain View, CA (US);
Abstract
Aspect of the technology are a method of designing a circuit layout and corresponding computer systems and nontransitory computer media. The circuit layout is for use in forming a lithographic mask set for use in fabricating an integrated circuit. In the method the computer system divides a synthesized circuit design into cell partitions along critical paths of the synthesized circuit design. The computer system associates pins of the plurality of cell partitions with normalized pin timing values. The normalized pin timing values store magnitude differences between a reference timing slack and timing slacks of the plurality of pins. After optimizing the synthesized circuit design, the computer system repeats the method, and then the computer system determines whether to further optimize the plurality of cell partitions by comparing: (i) the pre-optimization normalized pin timing values of the plurality of cell partitions with (ii) the post-optimization normalized pin timing values of the plurality of cell partitions.