The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Jul. 06, 2010
Applicants:
Erik Roelof Loopstra, Eindhoven, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Uwe Bruno Heini Stamm, Goettingen, DE;
Inventors:
Erik Roelof Loopstra, Eindhoven, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Uwe Bruno Heini Stamm, Goettingen, DE;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/72 (2006.01); G03B 27/68 (2006.01); G03B 27/42 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract
An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface constructed and arranged to guide the laser radiation away from the optical gain medium.