The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Mar. 08, 2011
Jun-chi Huang, Taichung County, TW;
Po-chao Tsao, Tainan, TW;
Ming-te Wei, Changhua County, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A mark structure for measuring the alignment accuracy between a former layer and a latter layer with electron beam inspection (EBI) is described. The mark structure includes multiple divisions, each of which includes at least one region that includes multiple parts each disposed with a pair of a pattern of the former layer and a pattern of the latter layer. In each region, all of the parts have the same distance in a direction between the pattern of the former layer and the pattern of the latter layer. The distance in the direction is varied over the regions of the divisions of the mark structure.