The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2013
Filed:
Mar. 23, 2010
Kana Fujii, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Shinki Yamada, Shizuoka, JP;
Toru Fujimori, Shizuoka, JP;
Kana Fujii, Shizuoka, JP;
Shuji Hirano, Shizuoka, JP;
Shinki Yamada, Shizuoka, JP;
Toru Fujimori, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of Rand Rindependently represents a hydrogen atom or an alkyl group which may have a substituent, and Rrepresents a phenyl group which may have a substituent.