The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Aug. 21, 2012
Gregory R. Bettencourt, Fremont, CA (US);
Gautam Bhattacharyya, Fremont, CA (US);
Simon Gosselin, Fremont, CA (US);
Sandy Chao, Sunol, CA (US);
Gregory R. Bettencourt, Fremont, CA (US);
Gautam Bhattacharyya, Fremont, CA (US);
Simon Gosselin, Fremont, CA (US);
Sandy Chao, Sunol, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.