The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Nov. 12, 2012
Mitutoyo Corporation, Kawasaki, JP;
Robert K. Bryll, Bothell, WA (US);
Mark L. Delaney, Shoreline, WA (US);
Mitutoyo Corporation, Kawasaki-shi, JP;
Abstract
A system and method for correcting surface height measurements for optical aberration is provided. Heights determined by an autofocus tool, which may depend on surface feature angles in a focus region of interest (ROI) and on the ROI location in the field of view, are corrected based on a novel error calibration. Error calibration data includes height corrections for different feature angles in images, and for multiple locations in a field of view. Height corrections are determined by weighting and combining the angle dependent error calibration data, e.g., based on a gradient (edge) angle distribution determined in the ROIs. When Z-heights are determined for multiple ROIs in a field of view, storage of image data from particular images of a global image stack may be efficiently controlled based on determining early in processing whether a particular image is a sufficiently focused 'near-peak' focused image or not.