The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2013
Filed:
Feb. 09, 2009
Bobby Kadkhodayan, Pleasanton, CA (US);
Jon Mcchesney, Santa Clara, CA (US);
Eric Pape, Newark, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Bobby Kadkhodayan, Pleasanton, CA (US);
Jon McChesney, Santa Clara, CA (US);
Eric Pape, Newark, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A flexible polymer or elastomer coated RF return strap to be used in a plasma chamber to protect the RF strap from plasma generated radicals such as fluorine and oxygen radicals, and a method of processing a semiconductor substrate with reduced particle contamination in a plasma processing apparatus. The coated RF strap minimizes particle generation and exhibits lower erosion rates than an uncoated base component. Such a coated member having a flexible coating on a conductive flexible base component provides an RF ground return configured to allow movement of one or more electrodes in an adjustable gap capacitively coupled plasma reactor chamber.