The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
Oct. 09, 2008
Applicants:
Tuung Luoh, Hsinchu, TW;
Sheng-hui Hsieh, Hsinchu, TW;
Shing-ann Luo, Hsinchu, TW;
Chin-ta Su, Hsinchu, TW;
Ta-hung Yang, Hsinchu, TW;
Kuang-chao Chen, Hsinchu, TW;
Inventors:
Tuung Luoh, Hsinchu, TW;
Sheng-Hui Hsieh, Hsinchu, TW;
Shing-Ann Luo, Hsinchu, TW;
Chin-Ta Su, Hsinchu, TW;
Ta-Hung Yang, Hsinchu, TW;
Kuang-Chao Chen, Hsinchu, TW;
Assignee:
MACRONIX International Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system.