The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2013
Filed:
Feb. 08, 2011
Ming-hsi Yeh, Hsinchun, TW;
Yu-fu Lin, Hsinchu, TW;
Shao-yen Ku, Jhubei, TW;
Chi-ming Yang, Hsian-San District, TW;
Chin-hsiang Lin, Hsin-Chu, TW;
Ming-Hsi Yeh, Hsinchun, TW;
Yu-Fu Lin, Hsinchu, TW;
Shao-Yen Ku, Jhubei, TW;
Chi-Ming Yang, Hsian-San District, TW;
Chin-Hsiang Lin, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method of making an integrated circuit is provided. The method includes providing a substrate having a photosensitive layer. The photosensitive layer is exposed to a radiation beam. The exposed photosensitive layer is developed in a first chamber. In the first chamber, a cleaning process is performed on the developed photosensitive layer. The cleaning process includes using a rinse solution including at least one of ozone, hydrogen peroxide, and oxalic acid.