The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Oct. 17, 2011
Yoshifumi Ueno, Hiratsuka, JP;
Georg Soumagne, Hiratsuka, JP;
Shinji Nagai, Hiratsuka, JP;
Akira Endo, Jena, DE;
Tatsuya Yanagida, Hiratsuka, JP;
Yoshifumi Ueno, Hiratsuka, JP;
Georg Soumagne, Hiratsuka, JP;
Shinji Nagai, Hiratsuka, JP;
Akira Endo, Jena, DE;
Tatsuya Yanagida, Hiratsuka, JP;
Gigaphoton Inc., Tochigi, JP;
Abstract
In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinderis arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinderare provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.