The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Jan. 30, 2008
Kentaro Yamada, Shunan, JP;
Takeshi Shimada, Hikari, JP;
Kotaro Fujimoto, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The invention provides a dry etching method for processing a wafer having an Ru film formed on a thick AlOfilm to be used for a magnetic head, capable of realizing high selectivity. In the etching of a wafer having disposed on an NiCr filman AlOfilm, an Ru film, an SiOfilmand a resist mask, the Ru filmis etched via plasma using a processing gas containing Cland O(FIG.()), and thereafter, the Ru filmis used as a mask to etch the AlOfilmvia plasma using a gas mixture mainly containing BCland also containing Cland Ar (FIG.()).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile