The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Sep. 06, 2011
Shinichi Hayashi, Koshi, JP;
Yuichi Douki, Koshi, JP;
Akira Miyata, Koshi, JP;
Yuuichi Yamamoto, Tokyo-To, JP;
Kousuke Yoshihara, Koshi, JP;
Nobuaki Matsuoka, Koshi, JP;
Suguru Enokida, Koshi, JP;
Shinichi Hayashi, Koshi, JP;
Yuichi Douki, Koshi, JP;
Akira Miyata, Koshi, JP;
Yuuichi Yamamoto, Tokyo-To, JP;
Kousuke Yoshihara, Koshi, JP;
Nobuaki Matsuoka, Koshi, JP;
Suguru Enokida, Koshi, JP;
Tokyo Electron Limited, Minato-Ku, JP;
Abstract
A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.