The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
Jun. 28, 2011
Noriaki Nakayamada, Kanagawa, JP;
Seiji Wake, Shizuoka, JP;
Hideo Inoue, Kanagawa, JP;
Akihito Anpo, Tokyo, JP;
Noriaki Nakayamada, Kanagawa, JP;
Seiji Wake, Shizuoka, JP;
Hideo Inoue, Kanagawa, JP;
Akihito Anpo, Tokyo, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A charged particle beam pattern forming apparatus, includes a charge amount distribution calculation unit configured to calculate a charge amount distribution charged by vertical incidence of a charged particle beam on a pattern forming region of a target object; a position correction unit configured to calculate, using the charge amount distribution charged, a corrected position of each pattern forming position corrected for a misregistration amount including a misregistration amount dependent on a deflection position where the charged particle beam is deflected, the misregistration amount caused by an amount of charge; and a pattern generator configured to form a pattern in the corrected position by using the charged particle beam.