The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
Aug. 14, 2012
Rajinder Dhindsa, San Jose, CA (US);
Felix Kozakevich, Sunnyvale, CA (US);
James H. Rogers, Milpitas, CA (US);
David Trussell, Fremont, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Felix Kozakevich, Sunnyvale, CA (US);
James H. Rogers, Milpitas, CA (US);
David Trussell, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition on those surfaces. The plasma confinement rings include thermal chokes adapted to localize heating at selected portions of the rings that include the plasma exposed surfaces. The thermal chokes reduce heat conduction from those portions to other portions of the rings, which causes selected portions of the rings to reach desired temperatures during plasma processing.