The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
May. 22, 2007
James S. Castantini, Newburyport, MA (US);
Tent-chao D. Tao, Saugus, MA (US);
Erin M. Madden, Lynnfield, MA (US);
Donald N. Polner, Marblehead, MA (US);
James S. Castantini, Newburyport, MA (US);
Tent-Chao D. Tao, Saugus, MA (US);
Erin M. Madden, Lynnfield, MA (US);
Donald N. Polner, Marblehead, MA (US);
Axcelis Technologies Inc., Beverly, MA (US);
Abstract
An airflow management system and/or method used in particle abatement in semiconductor manufacturing equipment. In particular, the apparatus disclosed is capable of creating and managing a carefully controlled particle free environment for the handling of semiconductor wafers or similar articles. The apparatus is particularly suited to be used as an interface between an equipment front end module (EFEM) and a vacuum loadlock chamber or other such article of process equipment. The apparatus also enables relative motion between enclosures while maintaining a particle free environment utilizing a moving air diffuser mounted to an interface panel.