The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2013
Filed:
Mar. 15, 2012
Masahiro Hatakeyama, Tokyo, JP;
Shoji Yoshikawa, Tokyo, JP;
Takeshi Murakami, Tokyo, JP;
Kenji Watanabe, Tokyo, JP;
Yoshihiko Naito, Tokyo, JP;
Yasushi Toma, Tokyo, JP;
Tsutomu Karimata, Tokyo, JP;
Takehide Hayashi, Tokyo, JP;
Kiwamu Tsukamoto, Tokyo, JP;
Tatsuya Kohama, Tokyo, JP;
Noboru Kobayashi, Tokyo, JP;
Masahiro Hatakeyama, Tokyo, JP;
Shoji Yoshikawa, Tokyo, JP;
Takeshi Murakami, Tokyo, JP;
Kenji Watanabe, Tokyo, JP;
Yoshihiko Naito, Tokyo, JP;
Yasushi Toma, Tokyo, JP;
Tsutomu Karimata, Tokyo, JP;
Takehide Hayashi, Tokyo, JP;
Kiwamu Tsukamoto, Tokyo, JP;
Tatsuya Kohama, Tokyo, JP;
Noboru Kobayashi, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.