The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2013
Filed:
Apr. 21, 2010
Steven K. Grumbine, Aurora, IL (US);
Renjie Zhou, Aurora, IL (US);
Zhan Chen, Aurora, IL (US);
Phillip W. Carter, Naperville, IL (US);
Steven K. Grumbine, Aurora, IL (US);
Renjie Zhou, Aurora, IL (US);
Zhan Chen, Aurora, IL (US);
Phillip W. Carter, Naperville, IL (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives).