The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2013
Filed:
Aug. 06, 2007
Vladimir Vitalevich Ivanov, Moscow, RU;
Vadim Yevgenyevich Banine, Helmond, NL;
Konstantin Nikolaevich Koshelev, Troitsk, RU;
Vladimir Mihailovitch Krivtsun, Troitsk, RU;
Vladimir Vitalevich Ivanov, Moscow, RU;
Vadim Yevgenyevich Banine, Helmond, NL;
Konstantin Nikolaevich Koshelev, Troitsk, RU;
Vladimir Mihailovitch Krivtsun, Troitsk, RU;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.