The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2013
Filed:
Jun. 30, 2008
Matthew E Colburn, Hopewell Junction, NY (US);
Stephen M Gates, Ossining, NY (US);
Jeffrey C Hedrick, Montvale, NJ (US);
Elbert Huang, Tarrytown, NY (US);
Satyanarayana V Nitta, Poughquag, NY (US);
Sampath Purushothaman, Yorktown Heights, NY (US);
Muthumanickam Sankarapandian, Yorktown Heights, NY (US);
Matthew E Colburn, Hopewell Junction, NY (US);
Stephen M Gates, Ossining, NY (US);
Jeffrey C Hedrick, Montvale, NJ (US);
Elbert Huang, Tarrytown, NY (US);
Satyanarayana V Nitta, Poughquag, NY (US);
Sampath Purushothaman, Yorktown Heights, NY (US);
Muthumanickam Sankarapandian, Yorktown Heights, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for forming a self aligned pattern on an existing pattern on a substrate comprising applying a coating of a solution containing a masking material in a carrier, the masking material having an affinity for portions of the existing pattern; and allowing at least a portion of the masking material to preferentially assemble to the portions of the existing pattern. The pattern may be comprised of a first set of regions of the substrate having a first atomic composition and a second set of regions of the substrate having a second atomic composition different from the first composition. The first set of regions may include one or more metal elements and the second set of regions may include a dielectric. The first and second regions may be treated to have different surface properties. Structures made in accordance with the method. Compositions useful for practicing the method.