The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Nov. 20, 2009
Toshihiro Morisawa, Yokohama, JP;
Daisuke Shiraishi, Hikari, JP;
Satomi Inoue, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
There is provided an etching apparatus in which, without setting the information of the substance and the chemical reaction, a small number of representative wavelengths can be selected from a waveform at a lot of wavelengths, and an analysis process of etching data which needs large man-hours can be eliminated to efficiently set the monitoring of the etching. The etching apparatus includes: a lot/wafer/step-depending OES-data searching/acquiring functionfor acquiring a plurality of optical emission intensity waveforms along an etching-treatment time axis; a waveform-change-existence judgment functionfor judging the existence of the change of the plurality of light emission intensity waveforms; a waveform-correlation-matrix calculating functionfor calculating a correlation matrix between the optical emission intensity waveforms; a waveform classifying functionfor classifying the optical emission intensity waveforms into groups; and a representative-waveform selecting functionfor selecting a representative optical emission intensity waveform from the group.