The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Aug. 30, 2011
Shinichi Hayashi, Koshi, JP;
Yuichi Douki, Koshi, JP;
Akira Miyata, Koshi, JP;
Yuuichi Yamamoto, Tokyo-To, JP;
Kousuke Yoshihara, Koshi, JP;
Nobuaki Matsuoka, Koshi, JP;
Suguru Enokida, Koshi, JP;
Shinichi Hayashi, Koshi, JP;
Yuichi Douki, Koshi, JP;
Akira Miyata, Koshi, JP;
Yuuichi Yamamoto, Tokyo-To, JP;
Kousuke Yoshihara, Koshi, JP;
Nobuaki Matsuoka, Koshi, JP;
Suguru Enokida, Koshi, JP;
Tokyo Electron Limited, Minato-Ku, JP;
Abstract
A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit block for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.