The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Mar. 14, 2008
Alex Oudshoorn, Woerden, NL;
Leon Martin Levasier, Hedel, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Roland Blok, Eindhoven, NL;
Alex Oudshoorn, Woerden, NL;
Leon Martin Levasier, Hedel, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Roland Blok, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.