The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Jul. 20, 2007
Emre Tuncer, Santa Cruz, CA (US);
Hui Zheng, Round Rock, TX (US);
Vivek Raghavan, Mountain View, CA (US);
Anirudh Devgan, Austin, TX (US);
Amir Ajami, Sunnyvale, CA (US);
Alessandra Nardi, Hayward, CA (US);
Tao Lin, Sunnyvale, CA (US);
Pramod Thazhathethil, Bangalore, IN;
Alfred Wong, Brookline, MA (US);
Emre Tuncer, Santa Cruz, CA (US);
Hui Zheng, Round Rock, TX (US);
Vivek Raghavan, Mountain View, CA (US);
Anirudh Devgan, Austin, TX (US);
Amir Ajami, Sunnyvale, CA (US);
Alessandra Nardi, Hayward, CA (US);
Tao Lin, Sunnyvale, CA (US);
Pramod Thazhathethil, Bangalore, IN;
Alfred Wong, Brookline, MA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
A method for performing timing analysis includes receiving information specifying an integrated circuit. A neighborhood of shapes associated with the integrated circuit is then determined. Delay information associated with the integrated circuit is generated based on the neighborhood of shapes. The neighborhood of shapes may be determined by determining a first set of spacings to a boundary of a first cell from an internal shape. A second set of spacings may be determined from the boundary of the first cell to a shape of a second cell. A lithography process may be characterized using the first and second set of spacings.