The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2013
Filed:
Mar. 03, 2011
Takayuki Toshima, Kumamoto, JP;
Mitsuaki Iwashita, Yamanashi, JP;
Kazuyuki Mitsuoka, Yamanashi, JP;
Hidekazu Okamoto, Tokyo, JP;
Hideo Namatsu, Tokyo, JP;
Takayuki Toshima, Kumamoto, JP;
Mitsuaki Iwashita, Yamanashi, JP;
Kazuyuki Mitsuoka, Yamanashi, JP;
Hidekazu Okamoto, Tokyo, JP;
Hideo Namatsu, Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Disclosed is a supercritical processing apparatus and a supercritical processing method for suppressing the pattern collapse or the injection of material constituting a processing liquid into a substrate. A processing chamber receives a substrate subjected to a processing with supercritical fluid, and a liquid supply unit supplies a processing liquid including a fluorine compound to the processing chamber. A liquid discharge unit discharges the supercritical fluid from the processing chamber, a pyrolysis ingredient removing unit removes an ingredient facilitating the pyrolysis of a liquid from the processing chamber or from the liquid supplied from the liquid supply unit, and a to heating unit heats the processing liquid including a fluorine compound of hydrofluoro ether or hydrofluoro carbon.