The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2013

Filed:

Aug. 31, 2012
Applicants:

Hiroyuki Muto, Hitachinaka, JP;

Tsuyoshi Ohnishi, Hitachinaka, JP;

Isamu Sekihara, Hitachinaka, JP;

Inventors:

Hiroyuki Muto, Hitachinaka, JP;

Tsuyoshi Ohnishi, Hitachinaka, JP;

Isamu Sekihara, Hitachinaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 45/00 (2006.01); H01J 37/04 (2006.01); G01N 23/225 (2006.01);
U.S. Cl.
CPC ...
Abstract

An object of the present invention relates to realizing the processing of a sample by charged particle beams and the monitoring of the processed cross-section with a high throughput. It is possible to process an accurate sample without an intended region lost even when the location and the size of the intended region are unknown by: observing a cross-sectional structure being processed by FIBs by using a secondary particle image generated from a sample by the ion beams shaving a cross section; forming at least two cross sections; and processing the sample while the processing and the monitoring of a processed cross section are carried out.


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