The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Jan. 25, 2006
Nobutaka Magome, Kumagaya, JP;
Naoyuki Kobayashi, Fukaya, JP;
Yasuyuki Sakakibara, Moriya, JP;
Hiroaki Takaiwa, Kumagaya, JP;
Hisatsune Kadota, Hachioji, JP;
Nobutaka Magome, Kumagaya, JP;
Naoyuki Kobayashi, Fukaya, JP;
Yasuyuki Sakakibara, Moriya, JP;
Hiroaki Takaiwa, Kumagaya, JP;
Hisatsune Kadota, Hachioji, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (). The exposure device (EX) has a liquid supply mechanism () which supplies the liquid () between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism () stops the supply of the liquid () when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.