The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Jul. 16, 2010
Applicants:
Kouji Mitsuhashi, Nirasaki, JP;
Hiroyuki Nakayama, Nirasaki, JP;
Nobuyuki Nagayama, Nirasaki, JP;
Tsuyoshi Moriya, Nirasaki, JP;
Hiroshi Nagaike, Nirasaki, JP;
Inventors:
Kouji Mitsuhashi, Nirasaki, JP;
Hiroyuki Nakayama, Nirasaki, JP;
Nobuyuki Nagayama, Nirasaki, JP;
Tsuyoshi Moriya, Nirasaki, JP;
Hiroshi Nagaike, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 4/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); H05H 1/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
An internal member of a plasma processing vessel includes a base material and a film formed by thermal spraying of ceramic on a surface of the base material. The film is formed of ceramic which includes at least one kind of element selected from the group consisting of B, Mg, Al, Si, Ca, Cr, Y, Zr, Ta, Ce and Nd. In addition, at least a portion of the film is sealed by a resin.