The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2013
Filed:
Sep. 15, 2010
Santiago Del Puerto, Milton, NY (US);
Erik R. Loopstra, Eindhoven, NL;
Andrew Massar, Monroe, CT (US);
Duane P. Kish, Danbury, CT (US);
Abdullah Alikhan, Danbury, CT (US);
Woodrow J. Olsen, Stamford, CT (US);
Jonathan H. Feroce, Shelton, CT (US);
Santiago Del Puerto, Milton, NY (US);
Erik R. Loopstra, Eindhoven, NL;
Andrew Massar, Monroe, CT (US);
Duane P. Kish, Danbury, CT (US);
Abdullah Alikhan, Danbury, CT (US);
Woodrow J. Olsen, Stamford, CT (US);
Jonathan H. Feroce, Shelton, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.